Nano-particles and films of carbon nitride prepared by using the simple plasma sputtering deposition techniques

作者：Yang B Q^*; Li H Y; Shi Y C; Feng P X

来源：Surface Review and Letters, 2006, 13(6): 847-853.

DOI：10.1142/S0218625X06008943

• plasma sputtering deposition
• nanoscale CN particles
• CNx films
• distribution

Nanoscale particles and films of carbon nitride (CN) were synthesized on Si (100) substrates at room temperature by using simple plasma sputtering deposition techniques based on DC Glow Discharge with Hollow Cathode electrodes. The bonding structures of the films were investigated by X-ray photoelectron spectroscopy and Raman spectroscopy. G and D bands in Raman spectra of the samples were identified. Following an increase of the precursor nitrogen pressure, the intensity of the D band in Raman spectra of the sample became strong. Similar phenomenon was also observed with an increase of the bias voltage. Scanning electron microscope images of the samples indicated that smooth and uniform CN,: films were obtained at low bias voltages. Whereas, setting a pulsed bias voltage up to 5 kV, several groups of nanoparticles were observed. Each group of nanoparticles showed "sunflower" type of distribution.

• 出版日期2006-12
• 单位东华大学