作者:Telecka Agnieszka; Li Tao; Ndoni Sokol; Taboryski Rafael
来源:RSC Advances, 2018, 8(8): 4204-4213.
DOI:10.1039/c8ra00414e
摘要
We demonstrate the use of wafer-scale nanolithography based on block-copolymer (BCP) self-assembly for the fabrication of surfaces with enhanced wetting properties.