Assembly of methylated hollow silica nanospheres toward humidity-resistant antireflective porous films with ultralow refractive indices

作者：Ren, Hongbo^*; Zhu, Jiayi; Bi, Yutie; Xu, Yewei; Zhang, Lin^*

来源：Journal of Porous Materials, 2018, 25(1): 55-62.

DOI：10.1007/s10934-017-0420-3

• Methylated HSNs
• Porous films
• Ultralow refractive index
• Antireflective
• Humidity resistance

Humidity-resistant antireflective (AR) porous films with ultralow refractive indices were prepared via an one-step sol-gel process by assembly of methylated hollow silica nanospheres (HSNs). The hydrophobicity and refractive indices of silica-based AR porous films could be varied between 66.0A degrees and 115.0A degrees, and between 1.08 and 1.14, respectively, by tuning the MTES/TEOS molar ratios. A possible assembly mechanism was proposed according to the microstructure of methylated HSNs and porous films. The various properties of silica-based AR porous films were investigated and the AR porous film could demonstrate a good AR capability of 97.6% and excellent humidity resistance.

• 出版日期2018-2
• 单位中国工程物理研究院; 中国工程物理研究院激光聚变研究中心; 西南科技大学