Atomic force microscope method for sidewall measurement through carbon nanotube probe deformation correction

作者：Watanabe Masahiro^*; Baba Shuichi; Nakata Toshihiko; Morimoto Takafumi; Sekino Satoshi; Itoh Hiroshi

来源：Journal of Micro/ Nanolithography, Mems, and Moems, 2012, 11(1): 011009.

DOI：10.1117/1.JMM.11.1.011009

• AFM
• sidewall profile
• CNT probe
• surface reconstruction
• critical dimension
• van der Waals force

To use atomic force microscope to measure narrow vertical features is challenging. Using carbon nanotube (CNT) probes is a possible remedy. However, even with its extremely high stiffness, van der Waals attractive force from steep sidewalls bends CNT probes. This probe deflection effect causes deformation (or "swelling") of the measured profile. When measuring 100-nm-high vertical sidewalls with a 27-nm-diameter and 265-nm-long CNT probe, the probe deflection at the bottom is estimated as large as 5.8 nm. This phenomenon is inevitable when using long and thin probes. We proposed a method to correct this probe deflection effect. Detecting torsional motion of the base cantilever of the CNT probe makes it possible to estimate the CNT probe deflection. Using this information, we have developed a technique for correcting the probe deformation effect from measured profiles. This technique, in combination with correction of the probe shape effect, enables vertical sidewall profile measurement with AFM.

• 出版日期2012-3