A novel solution for cathodic deposition of porous TiO2 films

作者:Hu Chi Chang*; Huang Ching Chun; Chang Kuo Hsin
来源:Electrochemistry Communications, 2009, 11(2): 434-437.
DOI:10.1016/j.elecom.2008.12.012

摘要

The redox reaction between TiCl3 and NaNO3 to form Ti(IV) and NO2- prior to deposition in a specially designed TiCl3 NaNO3 solution is the key step effectively promoting the cathodic deposition of porous TiO2 films. The continuous reduction of NO2- to N-2 and NH3 generates extensive OH-, enhancing the deposition rate of TiO2. The linear sweep voltammetric (LSV) and electrochemical quartz crystal microbalance (EQCM) studies reveal the electrocatalytic effect of oxy-hydroxyl-titanium already deposited onto the substrate for the NO2- and N-2 reduction. The porous and crystalline structures of as-deposited and annealed TiO2 films are examined by field-emission scanning electron microscopic (FE-SEM), transmission electron microscopic (TEM) and selected area electron diffraction (SAED) analyses.