A new kind of chelating agent with low pH value applied in the TSV CMP slurry

作者：Hong Jiao; Liu Yuling; Zhang Baoguo; Niu Xinhuan; Han Liying; School of Electronic Information Engineering Hebei University of Technology; Tianjin Key Laboratory of Electronic Materials; Devices

来源：Chinese Journal of Semiconductors, 2015, 36(12): 147-150.

DOI：10.1088/1674-4926/36/12/126001

• low pH value
• alkaline slurry
• removal rate
• roughness

TSV(through silicon via) is an emerging technology, which can realize micromation compared with the conventional packaging and extend Moore’s law. Chemical mechanical polishing(CMP) is one of the most important steps in the process of TSV manufacture, and it is an enabling technology to extend Moore’s law in the past two decades. Low pressure, low abrasive and low p H value are the main requirements for copper interconnection.In this paper, the effect of different kinds of TSV slurry with FA/OⅡ or FA/O IV type chelating agent on CMP are studied. All kinds of slurry used in this study are alkaline with no added inhibitors. From the experiment results, it can be seen that the copper removal rate and surface roughness achieved by using the FA/OⅣ type chelating agent with a low p H value is superior to using the FA/OⅡ type chelating agent.

• 出版日期2015
• 单位河北工业大学