Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar

作者:Talkenberg Florian; Illhardt Stefan; Radnoczi Gyoergy Zoltan; Pecz Bela; Schmidl Gabriele; Schleusener Alexander; Dikhanbayev Kadyrjan; Mussabek Gauhar; Gudovskikh Alexander; Sivakov Vladimir
来源:JOURNAL OF VACUUM SCIENCE %26 TECHNOLOGY A, 2015, 33(4): 041101.
DOI:10.1116/1.4921726