摘要

We deposited NiO via atomic layer deposition on mesoporous SiO2 particles with diameters of several hundred micrometers and a mean mesopore size of similar to 14 nm. NiO was deposited within the shell region of mesoporous SiO2 particles with a shell thickness of similar to 11 mm. We annealed the as-prepared NiO/SiO2 at 450 and 600 degrees C, respectively. These two samples were used as catalysts for the uptake of toluene molecules and their oxidative conversion to CO2. The sample annealed at 450 degrees C was generally more reactive in toluene uptake and its subsequent conversion to CO2. When the NiO/SiO2 annealed at 450 degrees C was exposed to toluene vapor at 160 degrees C and then heated to 450 degrees C, CO2 was emitted with almost no toluene desorption. We suggest that our catalysts can be used as building blocks for odor removal devices that operate below 200 degrees C. These catalysts can be regularly regenerated at similar to 450 degrees C.

  • 出版日期2016-11