Analysis on the ionization of high power pulsed unbalanced magnetron sputtering powered by direct current

作者：Mu Zong Xin^*; Mu Xiao Dong; Wang Chun; Jia Li; Dong Chuang

来源：Acta Physica Sinica, 2011, 60(1): 015204.

• discharge
• pulse technology

High Power impulse Unbalanced Magnetron Sputtering has been coupled to a direct current source (dc-HPPUMS or dc-HiPUMS). A coaxial coil and an attached hollow cathode were applied to control discharge properties and improve pulsed power density. A large extent breakdown was induced for avalanche discharge mechanism. The magnetic trap on sputtering target traps the secondary electrons excited by the avalanche and forms a drift current in magnetic trap. The peak pulse current density is higher than 100 A/cm(2) with a pulse frequency less than 40 Hz. The space charge limited condition controls the discharge for plasma far away from equilibrium. The discharge theory was taken to describe the high ionization mechanism in dc-HPPUMS discharge. The parameters deduced from Child law agree with the experimental results.

• 出版日期2011-1
• 单位大连理工大学