NanoSIMS50 analyses of Ar/O-18(2) plasma-treated Escherichia coli bacteria

作者:Clement F*; Lecoq E; Duday D; Belmonte T; Audinot J N; Lentzen E; Penny C; Cauchie H M; Choquet P
来源:New Journal of Physics, 2011, 13: 113040.
DOI:10.1088/1367-2630/13/11/113040

摘要

Reactive oxygen species (ROS) can be produced by electrical discharges and can be transported in uncharged regions by gas flows, in the so-called afterglows. These species are well known to have bactericidal effects but interaction mechanisms that occur with living micro-organisms remain misunderstood. In order to better understand these interactions, new analysis approaches are necessary. High-lateral-resolution secondary ion mass spectrometry (NanoSIMS) is one of the most promising ways of retrieving additional information on bacteria plasma inactivation mechanisms by combining isotopic imaging of plasma-treated bacteria and the use of O-18(2) as process gas. Indeed, this technology combines a lateral resolution of a few tens of nanometres that is sufficient to image the interior of bacteria, and a high mass resolution allowing detection of isotopes present in low quantities (a few ppm or lower) within the bacteria. The present paper deals with Ar-O-18(2) (2%) plasma treatment, through low-pressure microwave late afterglows, of Escherichia coli bacteria and their elemental and isotopic imaging by NanoSIMS. E. coli bacteria have been exposed to this reactive medium for varying treatment duration while keeping all other parameters unchanged. Our main goal is to determine whether the quantity of O-18 fixed in treated bacteria and the NanoSIMS50 lateral resolution are sufficient to give additional information on E. coli bacteria-plasma interaction.

  • 出版日期2011-11-29