Low-Loss Amorphous Silicon Multilayer Waveguides Vertically Stacked on Silicon-on-Insulator Substrate

作者：Kang JoonHyun^*; Atsumi Yuki; Oda Manabu; Amemiya Tomohiro; Nishiyama Nobuhiko; Arai Shigehisa

来源：Japanese Journal of Applied Physics, 2011, 50(12): 120208.

DOI：10.1143/JJAP.50.120208

Low-loss amorphous-silicon (a-Si) waveguides comprising three vertically stacked layers prepared on silicon-on-insulator substrates are demonstrated. We have fabricated multilayer a-Si waveguides and investigated their loss characteristics; this is the first such investigation to our knowledge. All the process temperatures were regulated below 400 degrees C for the complementary metal oxide semiconductor (CMOS) backend process compatibility. When the surface roughness and sidewall roughness were decreased, the propagation loss decreased to 3.7 dB/cm even in the case of the third layer a-Si waveguide. Such low-loss waveguides can be effectively applied to realize multilayer stacked optical devices.

• 出版日期2011-12