APPLICATION OF ADVANCED OXIDATION PROCESS (H2O2/UV) FOR REMOVAL OF ORGANIC MATERIALS FROM PHARMACEUTICAL INDUSTRY EFFLUENT

作者：Azizi Esmaeil; Fazlzadeh Mehdi; Ghayebzadeh Mehdi; Hemati Lida; Beikmohammadi Masoumeh; Ghaffari Hamid Reza; Zakeri Hamid Reza; Sharafi Kiomars^*

来源：Environment Protection Engineering, 2017, 43(1): 183-191.

DOI：10.5277/epe170115

Pharmaceutical wastewater is one of the major complex and toxic industrial effluents containing little or no biodegradable organic matters. In this study, H2O2/UV based advanced oxidation process (AOP) was used to remove organic materials from pharmaceutical industry effluent. For the chemical oxygen demand (COD) removal radiation of medium pressure mercury vapor UV lamp was used in the presence of hydrogen peroxide (H2O2/UV). Results indicated that the efficiency of COD removal depends on the initial concentration of H2O2, oxidation time and pH. The efficiency of COD removal at low H2O2 concentration was very low even coupled with UV light, which can be attributed to the low generation of hydroxyl radicals (OH center dot). At high concentration of H2O2 (500 mg/dm(3)) and optimum pH (pH = 4), 87.6% removal efficiency could be achieved during 70 min oxidation. For high concentration of H2O2 (500 mg/dm(3)) at pH 3 and 7, the maximum COD removal efficiency was 28.5% and 15.2% respectively, indicating significant roles of pH and H2O2 concentration in the process of COD removal.

• 出版日期2017