Atomic and molecular layer deposition for surface modification

作者：Vaha Nissi Mika^*; Sievanen Jenni; Salo Erkki; Heikkila Pirjo; Kentta Eija; Johansson Leena Sisko; Koskinen Jorma T; Harlin Ali

来源：Journal of Solid State Chemistry, 2014, 214: 7-11.

DOI：10.1016/j.jssc.2013.11.040

• Adhesion
• Atomic layer deposition
• Hybrid
• Inorganic
• Surface treatment

Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gas-solid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. %26lt;br%26gt;However, thin - even non-uniform - atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid.

• 出版日期2014-6