Adsorption of gallium on GaN(0001) surface in ammonia-rich conditions: A new effect associated with the Fermi level position

作者：Kempisty Pawel^*; Strak Pawel; Sakowski Konrad; Krukowski Stanislaw

来源：Journal of Crystal Growth, 2014, 401: 78-81.

DOI：10.1016/j.jcrysgro.2013.10.055

• Computer simulation
• Surface processes
• Metal organic vapor phase epitaxy
• Nitrides
• Semiconducting III-V materials

Density functional theory (DFT) calculations were used to study GaN(0001) surface covered with NH3 ad molecules and NH2 radicals, corresponding to physical conditions during GaN growth by hydride vapor phase epitaxy (HVPE) and metalorganic vapor phase epitaxy (MOVPE). Using larger representation of the surface i.e. slabs of lateral size 4 x 4, the effect of the doping was examined, It is shown that for specific surface coverage the electron counting (EC) rule is fulfilled so that the pinning of the Fermi level by surface states and band bending disappears. In this case, according to Krukowski et al. (2013) [14], the doping of the semiconductor (n- or p-type) and the related Fermi level are extremely important for stability of the surface and the adsorption/desorption processes. The difference in adsorption energies of gallium atoms at n- and p-type GaN(0001) surface exceeds the energy gap. This effect is observed in a narrow range of surface coverage, therefore cannot be detected in the calculations using small systems i.e. 2 x 2 slabs. This new phenomenon may be crucial for the growth of GaN and the incorporation of dopants and impurities into semiconductor crystals.

• 出版日期2014-9-1