Ultrathin Carbon Films Prepared by Negative Cluster-Beam Technology

作者:Zhang Zao-Di; Wang Ze-Song; Wang Shi-Xu; Fu De-Jun*
来源:Chinese Physics Letters, 2012, 29(7): 078101.
DOI:10.1088/0256-307X/29/7/078101

摘要

We develop a miniaturized chamber installed on a tandetron accelerator into which negative ions of small carbon clusters are transported. Negative clusters C-1(-)-C-10(-) are obtained with beam currents of 1-10(4) nA at energies of 10-20 keV. C-2(-) beams of 0.2 mu A are used to directly deposit carbon films on SiO2/Si substrates. Formation of ultrathin carbon films are demonstrated by Raman scattering, which reveals the evolution of the graphitic peak (1550 cm(-2)) with deposition time.