Analysis of trace elements in opal using PIXE

作者：Hinrichs Ruth^*; Bertol A P L; Vasconcellos M A Z

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms , 2015, 363: 75-78.

DOI：10.1016/j.nimb.2015.08.008

• Opal
• Trace-element analysis
• PIXE

Particle induced X-ray emission (PIXE) analysis is particularly important for the analysis of trace elements of precious samples, being one of the few methods to determine elements with ppm concentration that does not affect sample integrity. A PIXE methodology for trace element analysis in opal was developed. To avoid detector count saturation due to the high number of Si-K alpha X-rays generated in the sample, several filters were employed to optimize the reduction of the Si-K alpha signal, while maintaining acceptable intensities of the other relevant X-ray lines. Two proton beam energies were tested, to establish the signal to noise ratio in different X-ray energies. Spectra were fitted with the software GUPIX, using a matrix composition determined with electron beam excited energy dispersive X-ray spectrometry. Above the energy of the silicon X-ray, several trace elements were quantified.

• 出版日期2015-11-15