科研之友
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摘要
We propose a scheme to overcome diffraction limit in optical lithography via graphene-plasmon (GP) interference. Taking advantage of the novel properties of GPs-tunability, low loss, and extremely large wave number-we can realize lithography with a resolution up to 1/100 wavelength in arbitrary one-and even simple two-dimensional patterns. An advantage of this method is that it works in the linear optics regime and does not require either multiphoton absorption materials or strong intensity lasers.
- 出版日期2017-5-19
