Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers

作者：Jackson Elizabeth A; Lee Youngmin; Radlauer Madalyn R; Hillmyer Marc A^*

来源：ACS Applied Materials & Interfaces, 2015, 7(49): 27331-27339.

DOI：10.1021/acsami.5b08856

• tetrablock terpolymers
• solvent vapor annealing homopolymer blending
• selective etching nanoporous thin films
• perpendicularly oriented cylinders

Solvent vapor annealing treatments are used to control the orientation of nanostructures produced in thin films of a poly(styrene)-block-poly(isoprene)-block-poly(styrene)block-poly((+/-)-lactide) (PS-PI-PS-PLA) and its blends with PLA homopolymer. The PS-PI-PS-PLA tetrablock terpolymer, previously determined to adopt a core(PLA) shell(PS) cylindrical morphology in the bulk, gave perpendicular alignment of PLA cylinders over a limited range of thicknesses using a mixed solvent environment of tetrahydrofuran and acetone. On the other hand, perpendicular alignment was achieved regardless of film thickness by inclusion of 5 wt % homopolymer PLA in the PS-PI-PS-PLA tetrablock. Tapping mode atomic force microscopy (AFM) was used to visualize film surface morphologies. Subsequent reactive ion etching (RIB) and basic hydrolysis of PLA produced 15 nm pores in a PS-PI-PS triblock thin film matrix. Nanoporosity was confirmed by scanning electron microscopy (SEM) images and the vertical continuity of pores was confirmed by cross-sectional SEM analysis.

• 出版日期2015-12-16