Adsorptivity of silica-supported monoamide resins to U(IV) in nitric acid media

作者:Nogami Masanobu*; Sugiyama Yuichi; Ikeda Yasuhisa
来源:Journal of Radioanalytical and Nuclear Chemistry, 2010, 283(1): 177-180.
DOI:10.1007/s10967-009-0137-0

摘要

As a part of the development of resins with selectivity to U(VI) in HNO(3) media, adsorptivities of U(IV) onto some silica-supported monoamide resins in HNO(3) solutions have been examined. It was found that resins consisting of N,N-dimethylacrylamide (Silica-DMAA resins) showed higher selectivity to U(VI) than U(IV) in the concentration range of HNO(3) up to 9 mol/dm(3). On the other hand, a resin consisting of N-methyl-N-vinylbenzylacetamide (Silica-MVBAA) was found to show a higher selectivity to U(IV) under the same concentration range of HNO(3). Differences in the selectivity among the resins were explained by the difference in the conformation between the functional carbonyl groups of the monoamide resins and U species.

  • 出版日期2010-1