摘要

The sputter-deposited Cr-Si film prepared by glow discharge was comprised of equiaxed nanocrystalline Cr3Si with a grain size of less than 5 nm. The hardness of the nanocrystalline Cr3Si film was 2.37 times higher than that of coarse-grained Cr3Si, whereas the elastic modulus of nanocrystalline Cr3Si was equal to that of coarse-grained Cr3Si. Compared with the coarse grain of Cr3Si, the sputter-deposited nanocrystalline Cr3Si film exhibited higher ductility or toughness due to the GB-mediated deformation.