Manipulation of structure on silicon surfaces via chemical adsorption

作者：Xin Xia; Xu Gui Ying^*; Xiao Li; Bai Yan; Yuan Shi Ling

来源：Journal of Dispersion Science and Technology, 2007, 28(4): 519-524.

DOI：10.1080/01932690701277070

• silicon surfaces
• surface topographies
• contact angle
• XPS
• EIS
• AFM

Via chemical adsorption, various films were assembled onto silicon surfaces. The structures and properties of the monolayer- or bilayer-modified silicon surfaces, such as Si-C10H20 CH2OC(O) CF3, Si-C10H20CH2OH, and Si-C10H20-CH2-NH-C18H37, were investigated by various techniques. x-ray photoelectron spectroscopy (XPS) gave clear proofs of the formation of octadecylamine layer and other kinds of layers on silicon surfaces. The contact angle measurements showed that the wettability of silicon surfaces was dominated by the terminal functional groups of the attached layers. Atomic force microscopy ( AFM) observations showed that interesting patterns have formed on the monolayer- or bilayer-modified silicon surfaces. Electrochemical impedance spectra (EIS) measurements showed that the SiC10H20CH2- NH-C18H37 has a better ability to prevent charge transfer as compared with that of Si-C10H20CH2OH, which may find applications in the area of surface passivations.

• 出版日期2007
• 单位山东大学