科研之友
微信
新浪微博
Facebook
分享链接
摘要
The thin film growth dynamics of a molecular semiconductor, free-base phthalocyanine (H2Pc), deposited by organic molecular beam deposition, has been studied by atomic force microscopy (AFM) and height difference correlation HDCF) analysis. The measured dynamic scaling components (alpha(loc)=0.61 +/- 0.12, beta=1.02 +/- 0.08, and 1/z=0.72 +/- 0.13) are consistent with rapid surface roughening and anomalous scaling behavior. A detailed analysis of AFM images and simple growth models suggest that this behavior arises from the pronounced upward growth of crystalline H2Pc mounds during the initial stages of thin film growth.
- 出版日期2006-4
