Direct Electron-Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films

作者：Gibbons Francis P; Manickam Mayandithevar; Preece Jon A; Palmer Richard E; Robinson Alex P G^*

来源：Small, 2009, 5(23): 2750-2755.

DOI：10.1002/smll.200900071

• conductivity
• electron beam lithography
• fullerenes
• thin films

This work demonstrates the patterning of thin films (approximate to 25 nm) of a newly synthesized fullerene derivative by direct-write electron-beam lithography to produce highly conducting carbon microstructures. Scanning electron microscopy and atomic force microscopy are used to characterize the resulting microstructure morphology, whilst the resistivities of the structures are probed using four-point probe electrodes deposited on the microstructures by lift-off. The microstructures have a resistivity of approximate to 9.5 x 10(-3) Omega cm after exposure to an electron dose of 0.1 C cm(-2). The method may have applications in the generation and electrical contacting of organic electronics, organic photovoltaics, and lab-on-a-chip devices.

• 出版日期2009-12-4