Use of ion beam assisted deposition and low temperature annealing for the fabrication of low loss, vertically stacked alumina waveguide structures

作者：Nightingale J R^*; Goswami R; Duperre J; Dawson J M; Hornak L A; Korakakis D

来源：JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26(5): 1813-1816.

DOI：10.1116/1.2981080

Ion beam assisted deposition (IBAD) and low temperature annealing in an air atmosphere are used to significantly lower optical losses and environmentally stabilize electron beam deposited, stacked waveguide structures consisting of amorphous aluminum oxide and silica. IBAD is used to add energy to the deposition process and promote film densification, consequently lowering optical propagation losses by reducing the number of light-scattering void regions. Postdeposition, low temperature (600 degrees C and lower) annealing in an air atmosphere for short amounts of time (< 5 min) is used to further reduce losses by means of relaxing thin film stress and lowering scattering losses at the alumina/silica interface in stacked multilayer structures.

• 出版日期2008-10