Mechanism of the etching rate change of aluminosilicate glass in HF acid with micro-indentation

作者:Saito Yasuhiro*; Okamoto Shinya; Inomata Hiroyuki; Kurachi Junji
来源:Applied Surface Science, 2008, 255(5): 2290-2294.
DOI:10.1016/j.apsusc.2008.07.085

摘要

The etching rate of some kind of glass decreases with micro-indentation. This paper is concerned chiefly with the mechanism for aluminosilicate glass. The change of glass surface condition arising from the indentation and the etching has been examined with X-ray photoelectron spectroscopy (XPS). It was found that the leaching reaction observed through the HF acid etching at non-indented area was restricted at the indented area. The etching rate change should be attributed to the leaching mechanism.

  • 出版日期2008-12-30