Effect of Ag Layer Deposition Rate on Transparent Conductive Properties of SnO2/Ag/SnO2Three-layer Film

作者：Wang, Chongjie; Zhu, Bailin^*; Zhao, Xuan; Ma, Junmin; Wu, Jun; Gan, Zhanghua; Liu, Jing

来源：Journal of the Chinese Ceramic Society, 2019, 47(7): 900-907.

DOI：10.14062/j.issn.0454-5648.2019.07.06

• Continuous films
• Figure of merit (FOM)
• Figure of merits
• Percolation thresholds
• Rough surfaces
• Three-layer film
• Transparent conductive
• Tri layers

Ag films were prepared at two deposition rates (i.e., 0.065 and 0.750 nm/s), and the effect of deposition rate on the structure of Ag films was investigated. SnO2/Ag/SnO2tri-layer films with Ag layer deposited at two deposition rates were prepared, and their transparent conductive properties with respect to the effect of Ag layer thickness were investigated. The results indicate that the Ag film deposited at a higher deposition rate has a larger crystallite size and a lower surface roughness. That is, the films have higher crystallinity, and the continuous film can be formed more easily. SnO2/Ag/SnO2tri-layer films with Ag layer deposited at a higher deposition rate exhibit a higher figure of merit (FOM) at a thinner thickness of Ag layer (<6 nm). At a thicker thickness of Ag layer (>6 nm), tri-layer films with Ag layer deposited at a lower deposition rate exhibit a higher FOM, and the maximum FOM (4.73×10-2/Ω) obtained at Ag layer thickness of 8 nm is greater than that of tri-layer films with Ag layer deposited at higher deposition rate (i.e., 3.45×10-2/Ω). This unexpected result may be related to the fact that Ag layer with a rough surface has a higher transmittance at a greater Ag layer thickness.

• 出版日期2019-7-1
• 单位武汉科技大学