High-temperature oxidation behavior of Al4SiC4 ceramics

作者：Huang XX^*; Wen GW

来源：Rare Metal Materials and Engineering, 2006, 35(2): 189-194.

• Al4SiC4 ceramics
• oxidation kinetics
• oxide phase composition
• oxidation layer
• thermodynamics
• oxidation model

The oxidation behaviors of Al4SiC4 ceramics at 1200 degrees C - 1700 degrees C were investigated from three parts: the oxidation kinetics, the microstructure observation, the oxidation mechanism at high temperature, respectively. The results of the first part show that the Al4SiC4 ceramic has the excellent anti-oxidation property at high temperature, and the kinetics of oxidation obeys the parabolic law with an activation energy of 220 kJ.mol(-1). The results of XRD and SEM indicated that the oxide phase composition of the oxidation surface is composed of Al2O3 and aluminosilicate glass for the lower oxidation temperature (<= 1500 degrees C), or Al2O3, mullite and aluminosilicate glass for the higher oxidation temperature (>= 1600 degrees C). The oxide scales consist of an outer oxide layer, a middle oxide layer and a reaction layer over the temperature ranges. A number of pores exist in the middle oxide scale. The enthalpy and the Gibbs free energy of the possible reaction during the oxidation process were calculated. The next part is to infer and analysis the elevated oxidation process and established the elevated oxidation model of Al4SiC4 ceramics.

• 出版日期2006-2
• 单位哈尔滨工业大学