An Open Argon Dielectric Barrier Discharge VUV-Source

作者：Sobottka Axel^*; Droessner Lutz; Lenk Martin; Prager Lutz; Buchmeiser Michael R

来源：Plasma Processes and Polymers, 2010, 7(8): 650-656.

DOI：10.1002/ppap.200900145

• argon
• coatings
• curing of polymers
• excimer
• functionalization of polymers

An argon vacuum ultra violet (VUV) light lamp was built. The radiation source is driven by an RF generator in continuous wave (cw) mode at frequencies of 680 and 840 kHz, respectively. An optimum design was developed for an atmospheric pressure glow discharge in an open system. The UV power of the radiation source was measured and the time response of the dielectric discharge was investigated. Finally, the emission spectra were measured under different conditions. All components of the lamp were designed in way that they meet the requirements for a practical setup for the irradiation of miscellaneous samples for both surface modification and activation.

• 出版日期2010-8-23