Nondestructive detection of deviation in integrated circuits

作者：Baghaei Leili^*; Dai Bing; Pianetta Piero; Pease R Fabian W

来源：Journal of Vacuum Science and Technology B, 2010, 28(6): C6Q25-C6Q27.

DOI：10.1116/1.3518464

There exists a clear need for an inspection microscope that features suboptical resolution and high penetration but requires no ambient vacuum for the sample. The most prominent application of such microscope is the nondestructive examination of fabricated integrated circuits. Current semiconductor fabrication processes would require a resolution of approximately 10 nm to a penetration depth of 100 mu m. These requirements are expected to increase over time due to process shrinks. The coherent x-ray diffraction microscope is a recent development where highly coherent x-ray sources are used without focusing optics. Instead, the diffraction pattern of the beam is recorded, and reconstruction of the sample image is achieved by recovering the phase information using computational algorithms.

• 出版日期2010-11