科研之友
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摘要
novel inorganic polymer resin with high photosensitivity was prepared by grafting acrylate functional groups onto the backbone of polyvinylsilazane through a reaction with methyl-2-(bromo-methyl)acrylate via the highly efficient electrophilic substitution of allyl bromide. The as-modified polymer was characterized by H-1 NMR and 2D-H-1-H-1 NMR (COSY) methods to determine the reaction mechanism. Differential photocalorimetry, FT-IR spectroscopy and TGA were used to examine its properties. The modified polyvinylsilazane is a promising inorganic polymer photoresist with a high UV sensitivity and a 55% ceramic yield, which is useful for fabricating nonoxide ceramic microstructures using mold free photocuring shaping processes.
- 出版日期2007-11-1
- 单位中国人民解放军国防科学技术大学
