摘要
Fe-Ni alloy cluster-assembled films were obtained by a plasma-gas-condensation-type cluster-deposition method. We studied the magnetic and electrical properties of these assemblies prepared on an electrically grounded substrate [bias voltage (V-a) = 0 kV] and on a negatively biased substrate (V-a = -20 kV). The packing density and saturation magnetization per volume, M, are much larger for the assemblies prepared at V-a = -20 kV than those prepared at V-a = 0 kV, while the magnetic coercivity, H, and electrical resistivity, p, are much lower for the assemblies prepared at V-a = -20 kV than those prepared at V-a = 0 kV. For Ni-rich Fe-Ni alloy cluster-assembled films obtained at V-a = -20 kV, the H-c values can become smaller than 160 A/m (the precision limit of our superconducting quantum interference device magnetometer) by adjusting the initial cluster size. The magnetic and electrical properties of Fe-Ni cluster-assembled films are much improved in comparison with those of pure Fe cluster-assembled films.
- 出版日期2008-1
- 单位厦门大学