Deep etching of glass wafers using sputtered molybdenum masks

作者:Ceyssens Frederik*; Puers Robert
来源:Journal of Micromechanics and Microengineering, 2009, 19(6): 067001.
DOI:10.1088/0960-1317/19/6/067001

摘要

This note presents a simple, low-cost technology to fabricate very deep isotropically etched features in glass wafers. A process based on fast etching glass combined with a stress-optimized molybdenum mask layer and a photoresist was found to be very suitable for such purposes. The obtained performance, up to 1.2 mm deep etching, rivals the best existing techniques while being more cost-competitive and using widely available equipment.

  • 出版日期2009-6
  • 单位KU Leuven