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摘要
Aluminum oxide thin films were deposited onto fluorine-doped tin oxide-coated glass by drop photochemical deposition for the first time. The deposition solution was deionized water containing aluminum sulfate and sodium thiosulfate. Small amount of the solution was dropped on the substrate and irradiated with UV light. The solution was replaced with new one after 5 min irradiation, and the process was repeated 10 times. A film was not deposited without thiosulfate ions in the solution. The deposited films were transparent, and their band gap was larger than 4 eV. The O/Al composition ratio was about 1.2, smaller than the stoichiometric ratio 1.5.
- 出版日期2017-4
