Application of nanoscratching in electronic devices

作者:Ramiaczek Krasowska Maria*; Szyszka Adam; Prazmowska Joanna; Paszkiewicz Regina; Tlaczala Marek
来源:Optica Applicata, 2009, 39(4): 711-716.

摘要

The lithography is a basic operation in the fabrication process of semiconductor devices. The scaling ability is the reason why the atomic force microscopy (AFM) nanolithograpy is currently studied in many laboratories. In the paper, the results of the mechanical AFM lithography, named nanoscribing or nanoscratching, are presented. In this method, the pattern is created by mechanical interaction between the AFM tip and a sample. This interaction requires the application of large forces in micronewtons scale.

  • 出版日期2009