Development of CrN precipitates during the initial stages of PIII nitriding of stainless steel thin films

作者：Manova D^*; Hoeche T; Maendl S; Neumann H

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms , 2009, 267(8-9): 1536-1539.

DOI：10.1016/j.nimb.2009.01.075

• PVD
• PIII
• TEM
• Stainless steel
• Diffusion

Stainless steel thin films produced by ion beam sputtering (IBS) were used as a model system to investigate the nitrogen diffusion and CrN formation after 10 min of nitrogen plasma immersion ion implantation (PIII) at 350 degrees C and 450 degrees C. At 350 degrees C, a thin nitrided layer of 70 nm is formed, with additional diffusion of nitrogen along grain boundaries and the growth of CrN precipitates along these grain boundaries. For 450 degrees C, a complete nitriding of the whole 400 nm thick layer was observed, with the lower 75 nm consisting of an expanded phase and the upper 330 nm of a decomposed phase with CrN precipitates formed inside the original grains. Such a layered structure capturing the transformation process has not been observed before. A determination of time-temperature dependencies of this process and the transfer of these results for bulk material should be possible.

• 出版日期2009-5-1