Antireflective sub-wavelength gratings fabricated by UV-NIL

作者：Li, Xiaoli; Wang, Qingkang; Shen, Jun; Liu, Yanbo; Zhu, Zhaoying; Wan, Yongzhong; Niu, Xiaoming

来源：2008 2nd IEEE International Nanoelectronics Conference, INEC 2008, China,Shanghai, 2008-03-24 to 2008-03-27.

DOI：10.1109/INEC.2008.4585518

• Glass substrates
• Light transmittance
• Lithographic technologies
• Low-cost patterning
• Photorisist
• Quartz substrate
• Sub-wave length grating
• UV-nanoimprint lithography

Sub-wavelength gratings (SWGs) have been widely used in many fields since the structure has the function of antireflection and increase the light transmittance. Many researchers are fabricating SWGs on the glass substrate hoping that it can be used in solar cells, display or light emit diodes (LEDs). Nanoimprint is an emerging lithographic technology that promises high resolution, high throughput, and low cost patterning of nanostructures. In this paper, an antireflective SWGs on a quartz substrate with transparent resist by UV-nanoimprint lithography (NIL) is fabricated. The transmittance at the wavelengths from 1000 nm to 2000 nm were measured and compared with the same substrate without SWGs pattern. The results show that the SWGs pattern increases the transmittance by about 1.5%.

• 出版日期2008
• 单位上海交通大学; 同济大学