摘要

A detail theoretical investigation on the structure and electronic properties of inorganic hexagonal units and their higher order derivatives comprising group III (B. Al and Ga) and V (N, P and As) elements is performed. A series of 45 clusters, formed by a linear combination of hydrogen saturated hexagonal motifs up to five units, (MY)(2n+1)H2n+4 (M = B, Al, Ga; Y = N, P, As; n = 1-5) are considered to look into their metal-insulator-semiconductor (MIS) behavior. It is evident from the present study that the arsenic doped group III hexagonal units clearly have a decisive role in forming semiconductor materials.

  • 出版日期2012-1-11