Modeling the deflection of relativistic electrons in a bent silicon crystal

作者:Koshcheev V P*; Shtanov Yu N; Morgun D A; Panina T A
来源:Technical Physics Letters, 2015, 41(10): 946-949.
DOI:10.1134/S1063785015100089

摘要

The deflection of electrons with energies 855 MeV and 6.3 GeV in planar (111) channels of a bent silicon crystal has been numerically simulated using a TROPICS computer code with atomic diffusion coefficient constructed in the Doyle-Turner approximation of the isolated atom potential. It is established that the atomic diffusion coefficient tends to a minimum value in the region of maximum nuclear density of atomic chain, where the Kitagawa-Ohtsuki diffusion coefficient reaches a maximum value.

  • 出版日期2015-10

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