A novel oxidation-reduction route for successive ionic layer deposition of NiO1-x center dot nH(2)O nanolayers and their capacitive performance

作者：Lobinsky A A^*; Tolstoy V P; Gulina L B

来源：Materials Research Bulletin, 2016, 76: 229-234.

DOI：10.1016/j.materresbull.2015.12.023

• Oxides
• Thin films
• Electrochemical measurements
• Elecrochemical properties
• Energy storage

Successive ionic layer deposition (SILD) of NiO1.x center dot nH(2)O nanolayers was first performed by an oxidation-reduction route using a Ni(NO3)(2) and K2S2O8 aqueous solutions. The obtained nanolayers were characterized by SEM, EDX, XRD, XPS, UV-vis and FTIR spectroscopy and electrochemical techniques. The results showed that the as-synthesized product is formed by nanosheets with a thickness of 6-12 nm, having cubic crystal structure of NiO and rhombohedral structure of gamma-NiOOH. Electrochemical characterization of the sample prepared by 100 cycles of SILD indicated a capacitive behavior with the specific capacitance value of 1015 F/g at a current density of 1 A g(-1) in I mol L-1 KOH aqueous solution. Repeated cycling for 3000 charge-discharge cycles demonstrate 10% capacitance fade relative to the initial values. The presented convenient route of synthesis may be used for the preparation of NiO1-x center dot nH(2)O nanolayers with high surface area and a large capacitance.

• 出版日期2016-4