Methyl-terminated Si(111) surface as the ultra thin protection layer to fabricate position-controlled alkyl SAMs by using atomic force microscope anodic oxidation

作者：Okada R; Miyadera T; Shimada T^*; Koma A; Ueno K; Saiki K

来源：Surface Science, 2004, 552(1-3): 46-52.

DOI：10.1016/j.susc.2004.01.026

• atomic force microscopy
• auger electron spectroscopy
• surface chemical reaction
• reflection high-energy electron diffraction (RHEED)
• etching
• self-assembly
• silicon

Methyl-terminated Si(111) (Me-Si(111)) and bilayer-GaSe terminated Si (BGS) surfaces were investigated to explore their usefulness as the protection layer in the fabrication process of nanometer-scale self-assembled monolayers (SAMs). BGS was not stable in the reagent involved in the alkyl SAM formation, whereas Me-Si(111) was suitable for the protection layer. Anodization using atomic force microscope (AFM) and following HF and hexadecene treatments were performed to form nano-scale alkyl SAM lines on the Me-Si(111) surface. It was found from AFM observation and frictional force measurement that only the patterned areas were selectively covered with hexadecyl SAMs.

• 出版日期2004-3-10