Nano-vanadium oxide thin films in mixed phase for microbolometer applications

作者:Subrahmanyam A*; Reddy Y Bharat Kumar; Nagendra C L
来源:Journal of Physics D: Applied Physics , 2008, 41(19): 195108.
DOI:10.1088/0022-3727/41/19/195108

摘要

Among the several phases of vanadium oxide, mixed phases of VO(2) and V(2)O(5) are preferred for uncooled micro-bolometers with low noise. The aim of this investigation is to achieve mixed phase VO(2) and V(2)O(5) thin films with nanometre grain sizes and high temperature coefficient of resistance (TCR). Since the phase depends upon the oxygen reactivity, these vanadium oxide thin films are prepared by reactive electron beam evaporation at different oxygen flow rates and substrate temperatures. The mixed phases have been evaluated throughx- ray diffraction and x-ray photo emission studies. The temperature dependence of resistance has shown that the films grown at 473K with 2.8 x 10(-5) mbar chamber pressure of oxygen (VO(2) : V(2)O(5) ratio of 36 : 64) have the highest TCR of -3.2K(-1) with a reasonable low resistance (120 Omega/square).

  • 出版日期2008-10-7