Nanopatterning by direct-write atomic layer deposition

作者：Mackus A J M^*; Dielissen S A F; Mulders J J L; Kessels W M M

来源：Nanoscale, 2012, 4(15): 4477-4480.

DOI：10.1039/c2nr30664f

A novel direct-write approach is presented, which relies on area-selective atomic layer deposition on seed layer patterns deposited by electron beam induced deposition. The method enables the nanopatterning of high-quality material with a lateral resolution of only similar to 10 nm. Direct-write ALD is a viable alternative to lithography-based patterning with a better compatibility with sensitive nanomaterials.

• 出版日期2012