Mechanophotopatterning on a Photoresponsive Elastomer

作者:Kloxin Christopher J; Scott Timothy F; Park Hee Young; Bowman Christopher N*
来源:Advanced Materials, 2011, 23(17): 1977-1981.
DOI:10.1002/adma.201100323

摘要

Photopatterning of a photoreversible covalent elastomeric network under mechanical :train, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.

  • 出版日期2011-5-3