摘要
Photopatterning of a photoreversible covalent elastomeric network under mechanical :train, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.
- 出版日期2011-5-3