Annealing Effect of Fluorine-Doped SnO2/WO3 Core-Shell Inverse Opal Nanoarchitecture for Photoelectrochemical Water Splitting

作者：Cho Seo Yoon; Kang Soon Hyung; Yun Gun; Balamurugan Maheswari; Ahn Kwang Soon

来源：Journal of the Korean Physical Society, 2017, 70(2): 162-168.

DOI：10.3938/jkps.70.162

• Photoelectrochemical water splitting
• WO3
• Core-shell nanostructure
• Annealing temperature

Fluorine-doped SnO2 inverse opal (FTO IO) was developed on a polystyrene bead template with a size of 350 nm (+/- 20 nm) by using the sol-gel-assisted spin-coating method. The resulting FTO IO film exhibited a pore diameter of 270 nm (+/- 5 nm), and a WO3 layer was electrodeposited with a constant charge of 400 mC/cm(2), followed by a high-temperature annealing process (400, 475, and 550 degrees C) to increase the crystallinity of the IO films. The annealing temperature affected the morphology and the overall resistance of the thin film, thus significantly affecting the photo-electrochemical performance. In particular, the FTO/WO3 IO film annealed at 475 degrees C exhibited a photocurrent density of 2.9 mA/cm(2) at 1.23 V versus normal hydrogen electrode, showing more than a three times higher photocurrent density in comparison with the other samples (550 degrees C), which is attributed to the large surface area and low resistance for the charge transport. Therefore, the annealing temperature significantly affects the morphological and the photoelectrochemical features of the FTO/WO3 IO films.

• 出版日期2017-1