科研之友
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摘要
The magnetic properties of Co/Si multilayer films produced through rf ion sputtering were studied in the temperature range 4.2-300 K. The dependences of the spontaneous magnetization and hysteresis characteristics of the films on the thicknesses of the magnetic layers and nonmagnetic spacers are established. It is shown that these dependences are determined to a large extent by interlayer interfaces, in which the effective magnetic moment of the Co atoms and the exchange interaction decrease and magnetic-anisotropy dispersion arises. A probable cause of the interface formation is interlayer mixing (which is estimated to penetrate to a depth of 15 angstrom) and the strong effect of Si on the Co electronic structure.
- 出版日期2007-2
