Study on spatial distribution of plasma parameters in a magnetized inductively coupled plasma

作者：Cheong Hee Woon^*; Lee Woohyun; Kim Ji Won; Whang Ki Woong; Kim Hyuk; Park Wanjae

来源：Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , 2015, 33(4): 041304.

DOI：10.1116/1.4923027

Spatial distributions of various plasma parameters such as plasma density, electron temperature, and radical density in an inductively coupled plasma (ICP) and a magnetized inductively coupled plasma (M-ICP) were investigated and compared. Electron temperature in between the rf window and the substrate holder of M-ICP was higher than that of ICP, whereas the one just above the substrate holder of M-ICP was similar to that of ICP when a weak (<8 G) magnetic field was employed. As a result, radical densities in M-ICP were higher than those in ICP and the etch rate of oxide in M-ICP was faster than that in ICP without severe electron charging in 90 nm high aspect ratio contact hole etch.

• 出版日期2015-7