Nanomechanical and Electrochemical Properties of Diamond-Like Carbon (DLC) Films Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) Technique

作者：Wang Jing; Liu Guichang^*; Xu Jun; Deng Xinlv; Wang Lida

来源：Plasma Science and Technology, 2010, 12(4): 461-465.

DOI：10.1088/1009-0630/12/4/15

• PECVD
• diamond-like carbon (DLC)
• Si/SiC intermediate layers
• stainless steel substrates

Diamond-like carbon (DLC) films was deposited successfully on stainless steel substrates with Si/SiC intermediate layers by combining plasma enhanced unbalanced magnetron sputtering physical vapor deposition (PEUMS-PVD) and microwave electron cyclotron resonance plasma enhanced chemical vapor deposition (MW-ECRPECVD) techniques. The effect of silicon dopant on the structure, morphology, nano mechanical properties and electrochemical behavior of DLC films were investigated by Raman spectroscopy, nano-indentation, atomic force microscopy (AFM) and potentiodynamic method and electrochemical impedance spectroscopy (EIS). It showed that the incorporated silicon atoms substituted sp(2)-bonded carbon atoms in the ring structures, promoting the formation of sp(3)-bonds. The structural transition from C-C to C-Si bonds resulted in the relaxation of the residual stress, leading to the decrease in films hardness. The DLC films with Si/SiC intermediate layers led to significant improvement in the corrosion resistance of the stainless steel substrate due to effective isolation and good chemical inertness of the DLC films.

• 出版日期2010-8
• 单位大连理工大学