An XPS and AFM study of Ar+-ion-etched Ni-W alloy surfaces prepared by DC magnetron sputtering

作者：Jasulaitiene Vitalija^*; Kondrotas Rokas; Pakstas Vidas; Miecinskas Povilas

来源：Chemija, 2010, 21(2-4): 73-79.

• Ni-W alloys
• heat treatment
• XPS
• AFM
• Ar+ ion etching

The surface of Ni-W alloy coatings deposited by direct-current (DC) reactive magnetron sputtering before and after annealing was examined by X-ray photoelectron spectroscopy (XPS) and with the atomic force microscope (AFM). The XPS depth profiles of as-deposited Ni-W alloys with a different content of W (25, 50 and 75 at. %) show the compositional and chemical shifts indicating an obvious increase of W content in all sputtering depth due to preferential Ni sputtering. The binding energy (BE) of Ni2p3 peaks increases with increasing the tungsten content in the alloy, while the binding energy of W4f7 peaks decreases with decreasing the nickel content; this reflects the well-known alloying effect on the chemical shifts. The heating (T = 850 degrees C in H-2) of as-sputtered Ni-W alloys shows that W is preferentially oxidized and causes the crystalline structure and a remarkable coarsening of alloy surfaces.

• 出版日期2010