摘要

Deposition, diffusion, and aggregation (DDA) on a two-dimensional small-world network have been investigated by computer simulations. This model is characterized by two parameters: the clustering exponent alpha and long-range connection rate phi. The results show that as alpha and phi vary there exists a continuous crossover in the fractal dimension D-f from 1.65 to 2, which corresponds to the crossover from the DDA pattern to dense one. The change of the aggregation pattern results from the long-range connection in the network, which reduces the effect of screening during the aggregation. With primitive analysis, we obtain the expressions of the fractal dimension D-f and the crossover point ce,. These results may be useful to describe the vapor deposition, molecular-beam epitaxy, and similar experiments on defective substrates.