An ion beam facility based on a 3 MV tandetron accelerator in Sichuan University, China

作者：Han, Jifeng; An, Zhu^*; Zheng, Gaoqun; Bai, Fan; Li, Zhihui; Wang, Peng; Liao, Xiaodong; Liu, Mantian; Chen, Shunli; Song, Mingjiang; Zhang, Jun

来源：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms , 2018, 418: 68-73.

DOI：10.1016/j.nimb.2018.01.002

• Tandetron accelerator
• Ion beam analysis
• Ion implantation
• Nuclear physics experiments
• Terminal voltage stability

A new ion beam facility based on a 3 MV tandetron accelerator system has been installed in Sichuan University, China. The facility was developed by High Voltage Engineering Europa and consists of three high-energy beam lines Including the ion beam analysis, ion implantation and nuclear physics experiment end stations, respectively. The terminal voltage stability of the accelerator is better than +/- 30 V, and the brightness of the proton beam is approximately 5.06 A/rad(2)/m(2)/eV. The system demonstrates a great application potential in fields such as nuclear, material and environmental studies.

• 出版日期2018-3-1
• 单位四川大学